高功率激光装置是一个复杂的有源巨型光学工程，其性能指标要求逼近科学技术与物理极限。驱动器研制有物理设计、工程光学和结构工程设计三大过程，工程光学在其中起着重要作用。高功率激光装置工程光学设计需遵循其特有的设计原则和要点，以保证装置的高性能。根据驱动器设计指标和设计特点，从总体光学设计、光束质量控制以及光束打靶精度控制方面，综述了高功率激光装置工程光学设计中的关键科学技术问题以及相应解决方法，为未来高功率激光驱动器的发展提供必要的工程设计参考。

为了解决气浮光学平台在水平方向超低频减振的问题以提高超精密实验的产出质量,提出基于调谐液柱阻尼器(TLCD)的气浮光学平台流固耦合理论,用来实现最优调谐控制和实验精度的提升。首先对TLCD进行原理分析并推导出固有频率的设计范围;其次对TLCD气浮光学平台流固耦合系统进行建模及推导;接着对流固耦合系统进行响应特性分析及参数优化;最后对时域响应和光学实验进行验证分析。结果表明,当固有频率比一定时,存在一个最优阻尼比可以使减振效率取得最大值,共振峰处的减振效率达到66.76%;同时通过调控小孔板可以使TLCD减振系统适合宽频激励的工况,气浮光学平台动力响应的有效控制有利于提高实验精度,为超精密实验品质的提升提供了一种有效控制手段。

为了解决由振动引起的神光Ⅱ系列装置光束指向精度变差的问题,提出光机耦合主动吸振理论,实现了控制参数的自适应调控和打靶偏差的更小输出。建立神光Ⅱ系列装置全链路光束传输系统模型,搭建空间滤波器光机耦合主动吸振系统,设计自适应模糊PID控制器,分析主动控制参数对输出光角响应峰值的影响并优化控制参数,分析各装置空间滤波器打靶偏差在自适应模糊PID控制主动阻尼动力吸振作用后的控制效果。结果表明,当主动阻尼动力吸振器调谐到最优阻尼时,其打靶偏差较传统方法降低了75.9%,同时被动阻尼动力吸振器也具有降低打靶偏差的功能,其打靶偏差较传统方法降低了31%左右。主动阻尼动力吸振器可根据打靶偏差大小调节速度反馈增益,使控制效率在31.0%~75.9%范围内变化,实现了自适应调节的反馈功能,实验结果与预期一致。

通过在石英玻璃的抛光过程中引入α-Al2O3颗粒,对抛光过程中石英工件表面产生的划痕类型和收尾阶段不同粒径杂质颗粒产生的划痕长度进行分析,同时研究了抛光液质量分数和抛光盘结构对石英玻璃抛光质量的影响。结果表明:杂质颗粒需要盘面提供足够大的支撑力才能在工件表面产生划痕,而杂质颗粒所受盘面的支撑力大小取决于其位置高度和共同参与受力的基质颗粒数量;杂质颗粒的位置高度很难掌控,但在相同工艺条件下,使用质量分数为6%的抛光粉和具有多微孔结构的沥青抛光盘可以有效降低划痕的产生概率,并且不会导致抛光表面粗糙度变差或过度影响抛光效率,对实际加工生产有指导意义。

针对传统方法抛光高功率激光实验中使用的长焦距列阵透镜单元遇到的检测困难、一致性差等问题，提出了采用环形抛光的新方法。对环形抛光系统的理论分析表明，抛光盘面形可以稳定在球面状态。利用这种特性，环形抛光法可以抛光小曲率球面。阐述了抛光盘面形的调节方法。利用0.69 m 环形抛光机对口径45 mm、曲率半径57207 mm 的列阵透镜单元进行了抛光，结果表明面形精度和一致性均优于平面摆动式抛光法。最后对环形抛光机可抛光的球面曲率半径范围进行了探讨，发现盘面尺寸越小球面抛光能力越强，直径0.8 m 的盘面可抛光的曲率半径可低至10 m。

针对传统方法抛光高功率激光实验中使用的长焦距列阵透镜单元遇到的检测困难、一致性差等问题，提出了采用环形抛光的新方法。对环形抛光系统的理论分析表明，抛光盘面形可以稳定在球面状态。利用这种特性，环形抛光法可以抛光小曲率球面。阐述了抛光盘面形的调节方法。利用0.69 m 环形抛光机对口径45 mm、曲率半径57207 mm 的列阵透镜单元进行了抛光，结果表明面形精度和一致性均优于平面摆动式抛光法。最后对环形抛光机可抛光的球面曲率半径范围进行了探讨，发现盘面尺寸越小球面抛光能力越强，直径0.8 m 的盘面可抛光的曲率半径可低至10 m。

对环形抛光法加工大小口径工件面形不一致的问题进行了研究。在0.69 m 环形抛光机上发现，φ100 mm 工件面形微凹时，φ48 mm 工件为峰谷(PV)值0.336 λ(λ = 632.8 nm) 的凸面形。利用Winkler假定和Preston方程对工件的面形进行了研究，发现倾覆力矩是引起面形不一致的主要原因。对于圆形工件的理论计算结果表明，当工件和抛光盘之间的摩擦系数与分离器对工件的作用力合力的高度的乘积大于工件直径0.125 倍时，工件将会变凸。对工件进行了加压、润滑和降低工件支撑位置等实验，发现加压不能改善工件面形一致性；在抛光液中添加润滑剂后一致性有了一定的改善，φ48 mm 工件PV 值降为0.128 λ ；而降低工件支持位置后，大小口径工件面形不一致性问题得到了解决，φ48 mm 工件PV 值降为0.058 λ ，且变为微凹面。此结果表明抛光盘与工件的摩擦系数不能太大，且分离器对工件的支持位置应尽量靠进盘面。

The problem that the workpieces with different sizes have different surface figures is studied in the continuous polishing process. The surface shape is a little concave and the peak valley (PV) value is 0.336 λ (λ = 632.8 nm) for the φ100 mm workpiece when polished in the 0.69 m continuous polishing machine. However, the φ48 mm workpiece is convex and the PV value is 0.336 λ . The Winkler′s hypothesis and the Preston equation are applied to study the surface shape of the workpiece, then the overturning moment of the workpiece is found to be the main reason for the surface inconformity. The theoretical analysis results show that to the round workpiece, when the product of the friction coefficient between the workpiece and the polishing pad and the resultant force from the separator to the workpiece is larger than 0.125 times diameter of the workpiece, the workpiece will turn to convex. The experiments of workpiece pressing, lubrication and moving down the supporting position of the separator is done. The results show that the consistency isn′t been improved by applying pressure on the workpiece; by adding lubricant to the polishing slurry, the consistency is improved as the surface PV of the φ48 mm workpiece is reduced to 0.128 λ ; and the inconsistency problem is solved as the surface PV of the φ48 mm workpiece is reduced to 0.058 λ and the shape is slightly concave when moving down the supporting position. The results indicate that the friction coefficient between the polishing pad and the workpiece shouldn′t be to large and the supporting position of the separator to the workpiece should as near to the polishing surface as possible in the continuous polishing process.

Aiming at the problems such as difficult to mearsure and bad consistency of the surfaces in polishing long-focus lens array elements by conventional method, the new way using continuous polishing machine is proposed. According to the theoretical research of the continuous polishing system, the surface of the polishing pad can keep spherical. The workpieces with small curvature spherical surfaces can be polished with the character. The adjusting methods of the polishing pad surface curvature are elaborated. According to the experiments of polishing lens array elements with aperture of 45 mm and curvature radius of 57207 mm in 0.69 m continuous polishing machine, the element surface accuracy and consistency are both better than using conventional oscillating polishing method. At last, the range of the curvature radius that can be polished in the continuous polishing machine is discussed and find that the smaller the polishing pad is, the stronger the ability of polishing spherical surface is. The radius of curvature which is polished in 0.8 m diameter can be as amall as 10 m.